Wriddhi Chakraborty (Notre Dame) Best Paper Award for Technology at the 2020 VLSI Symposia October 19, 2020
Mixology: Right Mix of Hafnium and Zirconium Provides a Surprising Boost in Permittivity in High-k Gate Dielectric June 05, 2020
Irish Graduate Student Anya Curran from Tyndall Institute Joins the Datta Group as Visiting Research Scholar March 30, 2020